The 245th Topical Symposium of the Magnetic Society of Japan

Novel microfabrication for magnetic applications

With the rapid development of digital society, expectations of high-density magnetic recording media are needed. However, it is difficult to fabricate higher-density magnetic recording media using current microfabrication methods. Consequently, novel approaches utilized the current methods, which have advanced in tandem with semiconductor processing, are under investigation and development for these new magnetic recording media. Additionally, pioneering strategies have been proposed within the realm of microfabrication, aiming to achieve even more intricate processing beyond the existing capabilities. This workshop invites lecturers to research the most advanced microfabrication techniques and methods for developing new magnetic recording media. Through this lecture, we hope to have discussions that will lead to the development of novel technologies for magnetic applications by the fusion of these fields. We look forward to the participation of many people.

Date:

November 10th (Friday), 2023 13:00 -17:20

Venue:

Hybrid
Onsite:Room 134, Building1, CST, Nihon University (Chiyoda-ku, Tokyo)
Online:Zoom

Admission Fee(incl. PDF) :

Free (reserved readers and students）
3,000 Yen (members and cooperate members）
6,000 Yen (non-members）

Booklet:

2,000 Yen (members, cooperate members and students）
4,000 Yen (non-members）

Registration:

Closed

Payment method:

MUFG Bank,　Jinbocho Branch　013-2259640
Paypal (Credit card)
Deadline：November 8th (Wednesday), 2023

In cooperation with:

The Japan Society of Applied Physics, The Physical Society of Japan

Information:

The Magnetic Society of Japan
Tel: 03-5281-0106/ E-mail: msj@bj.wakwak.com

Organizers:

Yoshitomo Kajinami (Daido Steel), Takayuki Kojima (Shinshu Univ.), Satoshi Demura (Nihon Univ.)

Program

13:00 – 13:40

“Nano fabrication of magnetic layer using a directed self assembly of a diblock copolymer”

○Akira Kikitsu (Toshiba)

13:40 – 14:20

“Spintronics Low Power semiconductors for carbon neutrality society and its scaling technology trends”

○Tetsuo Endoh (Tohoku Univ.)

14:20 – 15:00

“Low-temperature wafer bonding process and device applications”

○Hideki Takagi （AIST）

15:20 – 16:00

“Creation of Ultrafine Fabrication Materials and Processes which support for EUV Lithography”

○Hiroki Yamamoto (QST)

16:00 – 16:40

“Recent developments in sub-nano-fabrication using a non-uniform optical field”

○Takashi Yatsui (Toyohashi Univ. Tech.)

16:40 – 17:20

“Development of 3D magnetic memory and nano-fabrication technique”

○Teruo Ono (Kyoto Univ.)

The presentations will be given in Japanese.
Audio and/or visual recording is prohibited.